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Call for Papers:Alignment and Film Conferences at SPIE 2009
 
 
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一:Advances in Thin-Film Coatings for Optical Applications VI (OP311)



Part of the SPIE International Symposium on Optical Engineering + Applications


2-6 August 2009 • San Diego Convention CenterSan Diego, CA United States





The range of applications for which optical thin films are employed continues to expand at a remarkable pace. This conference will focus on the latest developments with the goal of disseminating these advancements within the optical coating community. In previous years


this conference has presented papers spanning all of the widely used deposition technologies including magnetron sputtering, plasma ion assisted deposition, ion beam sputtering, electron beam and thermal evaporation. The applications of these coatings have been as varied as the deposition technologies used to construct them. Significant developments in display technology, optical communications, femtosecond lasers, laser damage threshold, photovoltaic coatings,


space applications and even extremely low loss coatings employed in gravity wave antennas have all been presented.


We welcome papers describing advances in any aspect of thin film optical coatings, particularly within the following five areas:


• design of multilayer films and coatings


• novel optical coating and thin-film materials


• substrate preparation , deposition and pre- and post-processing manufacturing methods


• characterization, monitoring, and measurement


• innovative applications of optical coatings and thin-films.


Note: Special consideration will be given for papers in the area of thin film solar technology for an anticipated joint session.




Abstract Due Date: 19 January 2009
Manuscript Due Date: 7 July 2009




二:Optical System Alignment, Tolerancing,


and Verification III (OP312)


Part of the SPIE International Symposium on Optical Engineering + Applications


2-6 August 2009 • San Diego Convention CenterSan Diego, CA United States



After two successful conferences on alignment and tolerancing, we are adding the topic of system


verification to this conference. Thus the trio of tolerancing, alignment, and verification provides the


foundation for successful optical systems. We continue to emphasize that the assembly of actual optical systems requires alignment of different system components. The precision level of the alignment depends on the assigned tolerance error budget, and so alignment and tolerances are interrelated. This conference seeks to further the state-of-the-art in alignment and tolerancing, now including verification, by providing a forum where these essential topics can be discussed. The conference also seeks to provide the audience with past and current insights in these topics.


This third conference continues to build on the successful conferences held at SPIE Optics and


Photonics in 2007 and 2008.


Papers are solicited in the following areas:


• theories of alignment and tolerancing


• approaches to tolerancing and error budgets


• alignment techniques, equipment, and tools


• optical alignment examples


• alignment in traditional lens systems


• alignment of micro optics


• optical alignment of nanostructures


• case studies and alignment pitfalls


• alignment of aspherics


• reducing tolerances using active elements


• alignment in electro-optical systems


• alignment in metrology applications


• alignment of fiber optic systems


• active optical system alignment and tolerancing


• system verification approaches


• examples and applications of system verification


• tools and techniques for verification.


Abstract Due Date: 19 January 2009


Manuscript Due Date: 7 July 2009


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