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NANO2009 - 15th Seminar on Electron Beam and Ion Beam Lithography for Applications in Nanotechnology
作者 佚名 摘自 未知 发表 2008-12-16 10:34:05 人气 3253 背景色 杏仁黄 秋叶褐 胭脂红 芥末绿 天蓝 雪青 灰 银河白(默认色) 字号   

NANO2009 -

15th Seminar on Electron Beam and Ion Beam Lithography for Applications in Nanotechnology

held on March 2-3 2009 at Raith facilities in Dortmund, Germany.

The workshop is now open for registration. Please visit www.raith.com and check for "events / nanolithography seminar", or use this link: http://www.raith.com/index.php?xml=company%7CEvents%7CNanolithography+seminar

Electron Beam Lithography (EBL) and Ion Beam Lithography (IBL) are fundamental techniques for Nanofabrication in research and development. Today many different types of application have already been performed with lithography and Nanoengineering tools. The scope of this seminar is to give an overview of state-of-the-art applications and results produced from such systems. The seminar opens on Monday with a basic introduction into EBL techniques and closes on Tuesday with hands-on session using various Raith equipments.

After the seminar we offer a separate hands-on session on Wednesday (March 4) for those who are interested in learning more details on specific Raith tools. Please indicate on your registration form if you want to stay on Wednesday and participate.

Deadline for registration will be February 13th, 2009. Registration fee is 140,- EUR (incl. VAT)

Before January 16th, 2009 an early bird registration at 90,- EUR (incl. VAT) is possible.

上一篇文章 Call for Papers for Focus Is.
下一篇文章 CFP: ICINCO 2009

ieee-nanomed--Call for paper(CINS,2007-05-07,11890)


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